PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBER

摘要

Methods and apparatus for a gas delivery assembly are provided herein. In some embodiments, the gas delivery assembly includes a gas inlet funnel having a first volume; and a gas conduit having an inlet to receive a gas and an outlet to facilitate the flow of the gas out of the gas conduit and into the first volume, wherein the gas conduit has a second volume less than the first volume, and an increasing cross-section from a first cross-section proximate the inlet to a second cross-section proximate the outlet, wherein the second cross-section is non-circular. In some embodiments, each conduit has a longitudinal axis that intersects a central axis of the gas inlet funnel.