发明名称 POLISHING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing method preventing sticking of a polishing mechanism on a workpiece after polishing, which may cause damage of the workpiece after polishing or a problem with collecting efficiency. <P>SOLUTION: The polishing method of double side processing type is provided so as to polish the workpiece inserted between an upper and lower polishing mechanisms each having a mechanism to polish the workpiece in rotation or sliding, wherein the suction attachment force to the workpiece of the upper polishing mechanism is smaller than that of the lower polishing mechanism. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010042508(A) 申请公布日期 2010.02.25
申请号 JP20090267367 申请日期 2009.11.25
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 SHINTANI HISAFUMI
分类号 B24B37/08;B24B37/20;G11B5/84 主分类号 B24B37/08
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