| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a multiply-exposing technique that can prevent the processes from becoming complicated when forming mask patterns and efficiently form the mask patterns of the even shape conforming the design data. <P>SOLUTION: In the target design data 101, the multiply-exposing mask patterns are formed by carrying out a process of disposing auxiliary patterns 105 virtually connecting the tips 103a, 104a of a pair of the line design patterns 103, 104 facing each other with a predetermined space in between at the tips 103a, 104a in the design data. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
