发明名称 |
LASER PROCESSING METHOD, LASER PROCESSING APPARATUS, METHOD OF MANUFACTURING OPTICAL ELEMENT, AND OPTICAL ELEMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide technology for forming a large reformed layer with a large aspect ratio and a processing part into an inside or a surface of a material without causing restriction of a femtosecond laser device, enlarging an optical system, and having restriction of a depth position into the inside of the material. <P>SOLUTION: A laser processing apparatus 50 includes a laser device 1 and a diffraction type lens 3. The laser processing device 50 emits laser beam 5 (femtosecond laser) having a pulse width equal to or less than 10 picoseconds. The diffractive type lens 3 focuses the laser beam 5 passing through an aperture 2. The laser beam 5 focused by the diffractive type lens 3 is irradiated to a material 8 to be processed. High aberration property in the diffractive type lens is positively utilized by making the design wavelength of the diffractive type lens 3 different from the center wavelength of the femtosecond laser, so that a long focus is made to be deep by spherical aberration. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010042424(A) |
申请公布日期 |
2010.02.25 |
申请号 |
JP20080207137 |
申请日期 |
2008.08.11 |
申请人 |
OMRON CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY;OSAKA UNIV |
发明人 |
HIRONO SATOSHI;KOMINE SHINICHIRO;MATSUDA KATSU;MOCHIZUKI HIROTAKA;WATANABE REKI;ITO KAZUYOSHI;KOSEKI YASUYUKI |
分类号 |
B23K26/06;B23K26/00;G02B3/08;G02B5/18 |
主分类号 |
B23K26/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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