发明名称 |
THIN FILM ARRAY PANEL AND MANUFACTURING METHOD THEREOF |
摘要 |
A method of manufacturing a thin film array panel is provided, which includes: forming a gate line formed on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming an ohmic contact layer on the semiconductor layer; forming a data line and a drain electrode disposed at least on the ohmic contact layer, forming an oxide on the data line; etching the ohmic contact layer using the data line and the drain electrode as an etch mask; and forming a pixel electrode connected to the drain electrode. |
申请公布号 |
US2010047946(A1) |
申请公布日期 |
2010.02.25 |
申请号 |
US20090609568 |
申请日期 |
2009.10.30 |
申请人 |
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发明人 |
KIM SANG-GAB;KANG SUNG-CHUL;KANG HO-MIN;SONG IN-HO;CHOE HEE-HWAN |
分类号 |
G02F1/1368;H01L21/28;G02F1/136;H01L21/3205;H01L21/336;H01L23/52;H01L29/786;H01L31/036 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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