发明名称 THIN FILM ARRAY PANEL AND MANUFACTURING METHOD THEREOF
摘要 A method of manufacturing a thin film array panel is provided, which includes: forming a gate line formed on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming an ohmic contact layer on the semiconductor layer; forming a data line and a drain electrode disposed at least on the ohmic contact layer, forming an oxide on the data line; etching the ohmic contact layer using the data line and the drain electrode as an etch mask; and forming a pixel electrode connected to the drain electrode.
申请公布号 US2010047946(A1) 申请公布日期 2010.02.25
申请号 US20090609568 申请日期 2009.10.30
申请人 发明人 KIM SANG-GAB;KANG SUNG-CHUL;KANG HO-MIN;SONG IN-HO;CHOE HEE-HWAN
分类号 G02F1/1368;H01L21/28;G02F1/136;H01L21/3205;H01L21/336;H01L23/52;H01L29/786;H01L31/036 主分类号 G02F1/1368
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