| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad excellent in a polishing rate and polishing uniformity for a work, the polishing pad restraining a burr-like object from being formed on a polishing face of the polishing pad and reducing the generation of a scratch flaw. <P>SOLUTION: The polishing pad is a disk-shaped polishing pad with a groove formed in a polishing face side, the groove includes a cross-sectional shape (X) (i) in which a length (a) of an opening part is longer than a length (b) of the deepest part, and (ii) provided with a vertical side face part 2 perpendicular to a straight line 1 positioned with the polishing face and having a length substantially equal to a distance (d) between the deepest part and the straight line 1, and total length of the grooves with a distance between the center of disk shape and an intersection M getting longer than a distance between the center of disk shape and a contact point N is 50-100% to the total length of all the grooves formed in the polishing face side, wherein M is the intersection of a straight line positioned with the vertical side face part 2 and the straight line 1, and N is the contact point of a side face part 3 opposed to the vertical side face part 2 with the straight line 1. <P>COPYRIGHT: (C)2010,JPO&INPIT |
