发明名称 THERMAL TREATMENT EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide thermal treatment equipment which can suppress a heat capacity inside a reactor low, and can enhance rise and fall response performance of a temperature inside the reactor in the thermal treatment equipment for performing a predetermined thermal treatment onto a processing substrate inside the reactor. Ž<P>SOLUTION: A chamber 5 comprises: a first bell jar 7 formed of a quartz glass and surrounding a periphery of a processing substrate W; a second bell jar 9 covering the outside of the first bell jar 7, and also forming a predetermined space layer 8 between the second bell jar 9 and the first bell jar 7; first atmospheric pressure adjusting means 15, 16 for charging and discharging a gas in the space layer 8, thereby forming a predetermined atmospheric pressure; second atmospheric pressure adjusting means 2, 24 for charging and discharging the gas inside the chamber 5, thereby forming a predetermined atmospheric pressure; a control means 21 for controlling to drive the atmospheric pressure adjusting means; a first atmospheric pressure sensor S1 for detecting the atmospheric pressure of the space layer 8 to output a detection signal to the control means 21; and a second atmospheric pressure sensor S2 for detecting the atmospheric pressure inside the chamber 5 to output the detection signal to the control means 21. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010045195(A) 申请公布日期 2010.02.25
申请号 JP20080208307 申请日期 2008.08.13
申请人 COVALENT MATERIALS CORP 发明人 ICHINOKURA MASATO
分类号 H01L21/205;C23C16/46;H01L21/3065 主分类号 H01L21/205
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