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发明名称
Chemical mechanical polishing composition for silicon nitride layer
摘要
申请公布号
KR100944279(B1)
申请公布日期
2010.02.25
申请号
KR20070100112
申请日期
2007.10.05
申请人
发明人
分类号
C09K3/14
主分类号
C09K3/14
代理机构
代理人
主权项
地址
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