发明名称 SAMPLE MOUNTING ELECTRODE
摘要 PROBLEM TO BE SOLVED: To evenly retain a sample surface temperature even when density of a coolant groove or a heater is locally uneven. SOLUTION: The sample mounting electrode 113 is used in a plasma treatment device carrying out plasma treatment of a sample disposed in a treatment chamber by supplying treatment gas into the treatment chamber with a decompressed and exhausted interior, supplying high frequency energy into the treatment chamber, and creating plasma, and it is for mounting and holding the sample in the treatment chamber. The sample mounting electrode 113 is equipped with a base part 121 equipped with the coolant groove 122 for circulating a temperature-controlled coolant, and a soaking member 127 and a multilayer dielectric film 123 sequentially mounted on a face mounted with the sample of the base part 121. The soaking member is an AlSiC alloy, and the multilayer dielectric film mounted on the soaking member is equipped with a heater layer and an electrode layer for electrostatic adsorption held between dielectric films. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010045170(A) 申请公布日期 2010.02.25
申请号 JP20080207899 申请日期 2008.08.12
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YOSHIOKA TAKESHI;OMOTO YUTAKA;TSUBONE TSUNEHIKO
分类号 H01L21/683;H01L21/3065;H02N13/00 主分类号 H01L21/683
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