发明名称 |
Pattern generation method and charged particle beam writing apparatus |
摘要 |
A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.
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申请公布号 |
US7669174(B2) |
申请公布日期 |
2010.02.23 |
申请号 |
US20070671243 |
申请日期 |
2007.02.05 |
申请人 |
NUFLARE TECHNOLOGY, INC. |
发明人 |
EMI KEIKO;SUZUKI JUNICHI;ABE TAKAYUKI |
分类号 |
G06F17/50;G03F1/00;G03F7/20;G06F19/00;G21K5/00;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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