发明名称 Manufacturing process of thin film transistor
摘要 A thin film transistor includes a gate, a gate insulator layer, a channel layer, a source, a drain, and an ohmic contact layer. The gate insulator layer covers the gate; the channel layer is disposed on the gate insulator layer above the gate; the source and the drain are disposed on the channel layer; the ohmic contact layer is disposed between the channel layer and the source and drain. The ohmic contact layer is constituted by a number of film layers. As mentioned above, the thin film transistor has an ohmic contact layer constituted by a number of film layers. When the thin film transistor is turned off, the current leakage thereof is lowered than that of a conventional thin film transistor.
申请公布号 US7666725(B2) 申请公布日期 2010.02.23
申请号 US20080338511 申请日期 2008.12.18
申请人 CHUNGHWA PICTURE TUBES, LTD. 发明人 HSU MIN-CHING;MO YUNG-LUNG
分类号 H01L21/84 主分类号 H01L21/84
代理机构 代理人
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