| 摘要 |
The present is directed towards an imprint lithography system including, inter alia, a docking plate; a motion stage having a range of motion associated therewith, the range of motion having a periphery spaced-apart from the docking plate a first distance; and a body, having first and second opposed sides spaced-apart a second distance, selectively coupled between the docking plate and the motion stage, the first distance being greater than the second distance to minimize a probability of a collision between the docking plate, the motion stage and the body while transferring the body between the docking plate and the motion stage.
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