发明名称 |
Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device |
摘要 |
The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit provided in a portion where the substrate comes in and out in the buffer chamber, and a second transfer chamber having a roller for rewinding the substrate. The slit is provided with at least one touch roller, and the touch roller is in contact with a film formation surface of the substrate. In addition, the present invention also relates to a method for forming a film and a method for manufacturing a photoelectric conversion device that are performed by using such a film formation apparatus.
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申请公布号 |
US7666766(B2) |
申请公布日期 |
2010.02.23 |
申请号 |
US20060526097 |
申请日期 |
2006.09.25 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
HIURA YOSHIKAZU;ADACHI HIROKI;TAKAHASHI HIRONOBU;SUGAWARA YUUSUKE;ARAO TATSUYA;NISHI KAZUO;ARAI YASUYUKI |
分类号 |
H01L21/20;C23C16/54 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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