发明名称 Resistive random access memory and method for manufacturing the same
摘要 A resistive random access memory including, an insulating layer, a hard mask layer, a bottom electrode, a memory cell and a top electrode is provided. The insulating layer is disposed on the bottom electrode. The insulating layer has a contact hole having a first width. The hard mask layer has an opening. A portion of the memory cell is exposed from the opening and has a second width smaller than the first width. The top electrode is disposed on the insulating layer and is coupled with the memory cell.
申请公布号 US7667293(B2) 申请公布日期 2010.02.23
申请号 US20070898529 申请日期 2007.09.13
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 LEE MING-DAOU;HO CHIA-HUA;LAI ERH-KUN;HSIEH KUANG-YEU
分类号 H01L29/02 主分类号 H01L29/02
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