发明名称 |
Multi-focus scanning with a tilted mask or wafer |
摘要 |
A method for implementing discrete superpositioning of two or more defocal wafer images at different defocal positions in a lithographic step and scan projection system. The method includes tilting one of a mask and a wafer with respect to a scanning direction and splitting an illumination beam into at least two illumination areas which are in different defocus zones of the mask.
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申请公布号 |
US7667821(B2) |
申请公布日期 |
2010.02.23 |
申请号 |
US20050064322 |
申请日期 |
2005.02.23 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN BURN-J.;CHEN CHUN-KUANG;GAU TSAI-SHENG;LIN CHIA-HUI;LIU RU-GUN;SHIH JEN-CHIEH |
分类号 |
G03B27/42;G03B27/52 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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