发明名称 |
Positive resist composition and method for forming resist pattern |
摘要 |
A positive resist composition including a resin component (A) containing an acid dissociable dissolution inhibiting group whose alkali solubility increases under action of acid and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer comprising a first structural unit (a1) derived from a hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester containing an alcoholic hydroxyl group, in which 10 mol % or more and 25 mol % or less of a combined total of hydroxyl groups within the structural units (a1) and alcoholic hydroxyl groups within the structural units (a2) are protected with the acid dissociable dissolution inhibiting groups, and a weight average molecular weight of the copolymer prior to protection with the acid dissociable dissolution inhibiting groups is 2,000 or more and 8,500 or less.
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申请公布号 |
US7666569(B2) |
申请公布日期 |
2010.02.23 |
申请号 |
US20050540056 |
申请日期 |
2005.06.22 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SATO KAZUFUMI;HAGIHARA MITSUO;KAWANA DAISUKE |
分类号 |
G03F7/004;G03F7/00;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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