发明名称 Image sensor pixel having a lateral doping profile formed with indium doping
摘要 An active pixel using a transfer gate that has a polysilicon gate doped with indium. The pixel includes a photosensitive element formed in a semiconductor substrate and an n-type floating node formed in the semiconductor substrate. An n-channel transfer transistor having a transfer gate is formed between the floating node and the photosensitive element. The pixel substrate has a laterally doping gradient doped with an indium dopant.
申请公布号 US7666703(B2) 申请公布日期 2010.02.23
申请号 US20050036647 申请日期 2005.01.14
申请人 OMNIVISION TECHNOLOGIES, INC. 发明人 RHODES HOWARD E.;NOZAKI HIDETOSHI
分类号 H01L21/00 主分类号 H01L21/00
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