FOCUS RING, PLASMA PROCESSING APPRATUS AND PALASMA PROCESSING METHOD

摘要

PURPOSE: A focus ring, a plasma process apparatus and a plasma process method are provided to improve operation efficiency and reduce a running cost by expending the lifetime of the focus ring. CONSTITUTION: A process chamber(2) receives a substrate to be processed and performs a plasma process. A lower electrode is arranged in the process chamber. A high frequency power source(40) supplies a high frequency power to the lower electrode for generating a plasma. An upper electrode(21) is arranged to oppose the lower electrode. A focus ring(15) is placed on the lower electrode to surround the substrate.