发明名称 |
METHOD OF GATE DIELECTRIC FORMATION USING LOW TEMPERATURE CURING AND METHOD FOR MANUFACTURING ORGANIC THIN FILM TRANSISTOR USING THE SAME |
摘要 |
PURPOSE: A method of gate dielectric formation using a low temperature curing and a method for manufacturing an organic thin film transistor using the same are provided to improve the efficiency of an organic thin film transistor using a flexible substrate. CONSTITUTION: A gate electrode(30) is formed at an upper part of a substrate(10). A gate insulating layer(20) is coated on the lower part of a substrate including the gate electrode through a sol-gel method. The substrate with coated gate insulating layer is inserted into the solution including an OH radical and a curing is performed. The solution is heated to 20-150°C by using a heating element. The ultraviolet ray is radiated on the solution and curing is performed. A sol-gel method is one of a spin coating, a spray coating, a dip-coating, a wiping, and a roll coating.
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申请公布号 |
KR100943449(B1) |
申请公布日期 |
2010.02.22 |
申请号 |
KR20090076373 |
申请日期 |
2009.08.18 |
申请人 |
DONGGUK UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION |
发明人 |
KIM, SAM DONG;LEE, JAE SEO;OH, JUNG HUN;MOON, SUNG WOON |
分类号 |
H01L51/05;H01L21/31;H01L51/40 |
主分类号 |
H01L51/05 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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