发明名称 PLASMA POLYMERIZED THIN FILM AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A plasma polymer thin film with low dielectric constant is provided to ensure thermal stability and excellent mechanical property and to reduce a complex process for pre- and post- processing generated in a spin casting method. CONSTITUTION: A plasma polymer thin film with low dielectric constant is prepared by a linear precursor material represented by chemical formula 1 and a linear precursor material represented by chemical formula 2. In chemical formula 1, R1-R6 are independently selected from the group consisting of a hydrogen atom and a substituted or unsubstituted C1-C5 alkyl group; X is oxygen atom or C1-C5 alkylene group.
申请公布号 KR20100020501(A) 申请公布日期 2010.02.22
申请号 KR20100005202 申请日期 2010.01.20
申请人 SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION 发明人 JUNG, DONG GEUN;LEE, SUNG WOO;WOO, JI HYUNG
分类号 C08J5/22;C08K5/01;C08K5/54;H01L21/205 主分类号 C08J5/22
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