发明名称 |
PLASMA POLYMERIZED THIN FILM AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A plasma polymer thin film with low dielectric constant is provided to ensure thermal stability and excellent mechanical property and to reduce a complex process for pre- and post- processing generated in a spin casting method. CONSTITUTION: A plasma polymer thin film with low dielectric constant is prepared by a linear precursor material represented by chemical formula 1 and a linear precursor material represented by chemical formula 2. In chemical formula 1, R1-R6 are independently selected from the group consisting of a hydrogen atom and a substituted or unsubstituted C1-C5 alkyl group; X is oxygen atom or C1-C5 alkylene group.
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申请公布号 |
KR20100020501(A) |
申请公布日期 |
2010.02.22 |
申请号 |
KR20100005202 |
申请日期 |
2010.01.20 |
申请人 |
SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION |
发明人 |
JUNG, DONG GEUN;LEE, SUNG WOO;WOO, JI HYUNG |
分类号 |
C08J5/22;C08K5/01;C08K5/54;H01L21/205 |
主分类号 |
C08J5/22 |
代理机构 |
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