| 摘要 |
<p>PURPOSE: A coating-developing apparatus, a coating-developing method and a storage medium are provided to improve treatment quantity by rapidly sending back a substrate of a setting module after setting completion. CONSTITUTION: A recipe is selected(S1). A return schedule preparation part makes a return schedule of lot(S2). A controller practices processing toward the wafer of lot (S3). A temperature setting processing of the heat module is initiated(S4). The optimal time of the main arm is calculated(S5). According to the comparison result of the running time and optimal time, the following cycle 23 is processed(S6). The calculation about the optimal time is operated(S7). The atmosphere control of the main arm is determined through the comparison of the running time of the optimal time and executes cycle 23(S8). The optimal time of the main arm about each heat module is calculated(S9). The cycle 25 is processed after the waiting time of the main arm(S10).</p> |
