发明名称 |
METHOD OF MANUFACTURING A LARGE SCALE NANO PATTERN OF LGP USING PHOTORESIST PROCESS |
摘要 |
<p>PURPOSE: A method of manufacturing a large scale nano pattern of an LGP(Light Guide Panel) is provided to offer the uniformity of the light transmitted to the LGP panel by uniformly reflecting and dispersing the light. CONSTITUTION: A photosensitive resin layer is formed on a direct type light guide plate bottom surface. A mask formed with a predetermined scattering pattern is formed on the photosensitive resin layer. The UV light is irradiated on the top of mask. The photosensitive resin layer is hardened according to the predetermined scattering pattern. The photosensitive resin layer is developed to form the pattern.</p> |
申请公布号 |
KR20100019630(A) |
申请公布日期 |
2010.02.19 |
申请号 |
KR20080078305 |
申请日期 |
2008.08.11 |
申请人 |
SEKONIX CO., LTD. |
发明人 |
HWANG, GYU HWAN;HAN, BEOM TAEK;PARK, JIN SUNG |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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