APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA,申请号KR20050131752-传众专利搜索

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发明名称	APPARATUS FOR PROCESSING SUBSTRATE WITH PLASMA
摘要
申请公布号	KR100943432(B1)	申请公布日期	2010.02.19
申请号	KR20050131752	申请日期	2005.12.28
申请人		发明人
分类号	H01L21/205;H01L21/02	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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