Diffracting pattern i.e. diffraction grating, physical or geometric parameter real-time-monitoring method for semiconductor medium, involves determining current parameter vector from parameter vector associated to selected signature vector

摘要

The method involves bearing a scalar processor (25) to be selected among K-signature vectors, where the signature vectors minimize weighted sum of distance between a current signature vector and one of the signature vectors, and weighted sum of a criterion implementing a parameter vector associated to the former signature vector and another parameter vector associated to the selected signature vector at previous iteration. The current parameter vector is determined from the latter parameter vector associated to the selected signature vector. An independent claim is also included for a device for real-time monitoring evolution of a physical or geometric parameter of a diffracting pattern during chemical and/or physical treatment.