THIN FILM PRODUCTION METHOD AND THIN FILM PRODUCTION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a thin film production method and a thin film production device which can deposit a homogeneous thin film for a long period of time. SOLUTION: The thin film production method comprises: a substrate preparation process; a process where a target material is prepared at a position confronted with the substrate; and a film deposition process where the target material is irradiated with a laser beam as an energy beam so as to form a bloom comprising atoms released from the target material, and the atoms included in the bloom are fed to the surface of the substrate so as to deposit a thin film. In the film deposition process, the distance between the substrate and the target material is regulated in accordance with the luminous intensity of the bloom shown in the process (S21) to the process (S24). COPYRIGHT: (C)2010,JPO&INPIT