发明名称 |
TRANSPARENT CONDUCTIVE SUBSTRATE, AND MANUFACTURING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive substrate forming a titanium oxide-based transparent conductive film exhibiting excellent conductivity by a simple coating method. Ž<P>SOLUTION: The transparent conductive substrate with a specific resistance of not more than 9×10<SP>-3</SP>Ωcm is obtained by: forming a base layer consisting of a titanium oxide-based thin film of an anatase crystal phase on a transparent base material by coating a dispersion made by dispersing anstase-type titanium oxide-based fine particles in a dispersion medium and then vaporizing the dispersion medium; coating precursor liquid containing a reaction product (A) made by reaction of a titanium compound and hydrogen peroxide and a reaction product (B) made by reaction of a niobium compound or a tantalum compound and hydrogen peroxide onto the base layer; firing the coating; and heating the fired coating under a reducing atmosphere to perform annealing treatment to form a transparent conductive film made of niobium- or tantalum-doped titanium oxide on the base layer. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010040519(A) |
申请公布日期 |
2010.02.18 |
申请号 |
JP20090160950 |
申请日期 |
2009.07.07 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
NAKADA KUNIHIKO;SUGAWARA KENICHIRO |
分类号 |
H01B13/00;H01B5/14 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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