发明名称 TRANSPARENT CONDUCTIVE SUBSTRATE, AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive substrate forming a titanium oxide-based transparent conductive film exhibiting excellent conductivity by a simple coating method. Ž<P>SOLUTION: The transparent conductive substrate with a specific resistance of not more than 9×10<SP>-3</SP>Ωcm is obtained by: forming a base layer consisting of a titanium oxide-based thin film of an anatase crystal phase on a transparent base material by coating a dispersion made by dispersing anstase-type titanium oxide-based fine particles in a dispersion medium and then vaporizing the dispersion medium; coating precursor liquid containing a reaction product (A) made by reaction of a titanium compound and hydrogen peroxide and a reaction product (B) made by reaction of a niobium compound or a tantalum compound and hydrogen peroxide onto the base layer; firing the coating; and heating the fired coating under a reducing atmosphere to perform annealing treatment to form a transparent conductive film made of niobium- or tantalum-doped titanium oxide on the base layer. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010040519(A) 申请公布日期 2010.02.18
申请号 JP20090160950 申请日期 2009.07.07
申请人 SUMITOMO CHEMICAL CO LTD 发明人 NAKADA KUNIHIKO;SUGAWARA KENICHIRO
分类号 H01B13/00;H01B5/14 主分类号 H01B13/00
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