| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine uneven structure using a nanoimprint capable of faithfully forming an inversion formation of a mold on a resin without being affected by the kind of resin to be used and/or its molecular weight. Ž<P>SOLUTION: The manufacturing method includes the step for placing a resin 14 on a substrate 12, and the step for pressing a mold 16 having nano-level fine unevenness. When a radius of gyration in a Θ state of the resin is assumed to be Rg and the minimum size of a mold recessed part having the resin inserted is assumed to be L, the value of L/Rg is made to be 3 or more. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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