| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and method for measuring the decomposition rate of supply gas of a plasma system for easily and accurately measuring the supply gas decomposition rate of the plasma system without being affected by the kind, viscosity, or the like of gas and without introducing gas required for manufacturing other than the gas required for treatment at the system and the site for performing the treatment. Ž<P>SOLUTION: A physical property value of the supply gas to a reactor 3 of the plasma system, and a physical property value (viscosity, molecular weight, and the like) of the gas in the reactor 3 of the plasma system after plasma occurrence inside the reactor 3 of the plasma system are measured by a quartz crystal oscillator 1 under a predetermined pressure, a physical property dependent output depending on this physical property value is produced, and the supply gas decomposition rate is determined from the variation of the physical property dependent output of plasma gas with respect to the physical property dependent output of the supply gas. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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