| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus which prevents a transfer trouble from being caused. Ž<P>SOLUTION: In the substrate transfer apparatus, first to third guide plates 5, 6, and 7 in an LL/UL chamber 1 and a process chamber 2 have a plurality of floating gas jet holes 8. The first guide plate 5 and the second guide plate 6 are arranged vertically with two stages, an upper stage and a lower stage, while having a substrate bearing surface 5a and a substrate bearing surface 6a that are changed in level by an elevator mechanism 45, respectively. An end of the second guide plate 6 that faces the third guide plate 7 is provided with a guide portion 6b which guides a substrate 4 from a substrate bearing surface 7a of the third guide plate 7 to the substrate bearing surface 6a of the second guide plates 6. Likewise, an end of the third guide plate 7 that faces the first guide plate 5 is provided with a guide portion 7b which guides the substrate 4 from a substrate bearing surface 5a of the first guide plate 5 to the substrate bearing surface 7a of the third guide plates 7. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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