发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is good in sensitivity, resolution, adhesion, resist shape and peeling properties after curing, and a photosensitive element and a method for manufacturing a printed wiring board which use the same. <P>SOLUTION: The photosensitive resin composition comprises (A) a binder polymer, (B) a photopolymerizable compound comprising a compound of formula (1), and (C) a photopolymerization initiator. In the formula (1), R<SP>1</SP>and R<SP>2</SP>denote H or methyl: R<SP>3</SP>denotes H or a monovalent organic group; R<SP>4</SP>denotes a substituted or non-nsubstituted cyclic hydrocarbon group; -(XO)- and -(OY)- denote a (poly)oxyethylene chain, a (poly)oxypropylene chain, or a block copolymer chain or a random copolymer chain of ethylene oxide and propylene oxide, the total number of oxyethylene groups contained in -(XO)- and -(OY)- is 2-40, and the total number of oxypropylene groups is 0-40. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010039459(A) 申请公布日期 2010.02.18
申请号 JP20090001852 申请日期 2009.01.07
申请人 HITACHI CHEM CO LTD 发明人 MURAMATSU YUKIKO;MIYASAKA MASAHIRO
分类号 G03F7/027;G03F7/004;G03F7/029;G03F7/031;G03F7/40;H05K3/06;H05K3/18 主分类号 G03F7/027
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