发明名称 LASER CLEANING APPARATUS AND LASER CLEANING METHOD
摘要 A probe cleaning apparatus includes a cleaning-conditions database. The probe cleaning apparatus removes contamination from a probe by irradiating the probe by a laser beam, refers to the cleaning-conditions database based on information about the probe, such as material and shape, and controls properties of the laser beam, such as output intensity, pulse interval, wavelength, and pulse width, so that the probe cleaning apparatus removes the contamination from the probe without damaging the probe by heat.
申请公布号 US2010038560(A1) 申请公布日期 2010.02.18
申请号 US20090508140 申请日期 2009.07.23
申请人 FUJITSU LIMITED;FUJITSU MICROELECTRONICS LIMITED 发明人 TOKURA FUMIHIKO;KIKUCHI KATSUHIKO;AKASAKI YUJI
分类号 G21G5/00 主分类号 G21G5/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利