| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition, having excellent developability in forming a pattern film made of a hardened material of a photosensitive composition on a substrate by exposure and development, and further enhancing electric insulation of a formed pattern film, and a method of manufacturing the pattern film using the photosensitive composition. <P>SOLUTION: This photosensitive composition includes: (A) a siloxane polymer containing a siloxane polymer having a carboxyl group and a siloxane polymer having a cyclic ether group; and (B) at least one kind selected from a photoacid generating agent, a photoradical generating agent and a quinonediazide compound. According to this method of manufacturing a pattern film 1A made of hardened material of a photosensitive composition, after a photosensitive composition layer 1 made of the photosensitive composition is formed on a substrate 2, the photosensitive composition layer 1 of an exposed part 1a is hardened to be insoluble to a developing liquid by exposure, and subsequently developed to form a pattern film 1A made of a hardened material of the photosensitive composition. <P>COPYRIGHT: (C)2010,JPO&INPIT |
