发明名称 RADIATION-SENSITIVE COMPOSITION, ITS MANUFACTURING METHOD, AND PATTERN FORMING PROCESS
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having excellent resistance to crack, patterning property, and heat resistance. <P>SOLUTION: This radiation-sensitive composition contains the following components (A) and (B): (A) denotes at least one selected from the group consisting of a hydrolytic silane compound expressed by the formula (1) (wherein, R<SP>1</SP>, R<SP>2</SP>, X, and A denote 1-12C alkyl group or the like, 2-30C alkylene group or the like allowed to have substituent group, a hydrolytic group, and a quadrivalent organic group, respectively, p and q are 0-2 integer and 1-3 integer being independent from each other, respectively, and p+q=3), a hydrolysate of the hydrolytic silane compound, and a condensation product of the hydrolysate; and (B) denotes photooxygen generator. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010039023(A) 申请公布日期 2010.02.18
申请号 JP20080199263 申请日期 2008.08.01
申请人 JSR CORP 发明人 MAEDA YUKIO
分类号 G03F7/075;C08G77/54;G03F7/038 主分类号 G03F7/075
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