| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a surface-modified substrate plate having a fine and highly accurate modifying pattern on its surface. SOLUTION: This method for producing the surface-modified substrate plate 1 comprises a process of forming a recessed part 110 on the surface 11a of the substrate plate by covering the prescribed position of the surface 11a of the substrate plate 11 having light-transmitting property with a metal mask 12 and etching, a process of covering the whole surface of the substrate plate 11 with a negative type photoresist 13 without removing the metal mask 12, a process of patterning the resist layer 13' by exposing the negative type photoresist 13 from the reverse surface 11b side of the substrate plate 11 and then developing, a process of removing the metal mask 12 without removing the resist layer 13' and forming a modifying layer 15 by covering the whole surface of the substrate plate 11 with a modifying agent, and a process of removing the modifying layer 15 on the resist layer 13' together with the resist layer 13' covered by the modifying layer 15. COPYRIGHT: (C)2010,JPO&INPIT |
