| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection apparatus for uneven application to efficiently determine the existence of an uneven application possibly affecting a substrate. Ž<P>SOLUTION: The inspection apparatus 40 for uneven application to inspect the uneven application on the substrate to which an applied material is applied from a first end to a second end includes: an obtaining means 431 for obtaining an image of the substrate by utilizing an interference phenomenon; an extracting means 432 for extracting an inspection image corresponding to a predetermined region at a predetermined distance from the first end of the substrate from the image of the substrate; a projecting means 433 for obtaining projection data by projecting the inspection image in the application direction of the applied material; and determining means 436A (436B) for determining whether the projection data meets a predetermined condition. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
