发明名称 |
PATTERNED STRUCTURE FOR A THERMAL INTERFACE |
摘要 |
A method for producing a plate with a first face with protrusions confined by first and second grooves includes steps of: etching recessed zones into a plate; depositing a photoresist layer on the plate; forming a passivation layer over the photoresist layer; removing the passivation layer at the bottom of the recessed zones; electroplating metal in the recessed zones; removing the passivation layer; removing the photoresist layer; and removing the semiconductor material to expose the first and second grooves.
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申请公布号 |
US2010037461(A1) |
申请公布日期 |
2010.02.18 |
申请号 |
US20090538797 |
申请日期 |
2009.08.10 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MICHEL BRUNO;BRUNSCHWILER THOMAS J.;ROTHUIZEN HUGO E.;KLOTER URS |
分类号 |
B21D53/02;H01L23/10;H01L23/40;H01L23/42 |
主分类号 |
B21D53/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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