发明名称 PATTERNED STRUCTURE FOR A THERMAL INTERFACE
摘要 A method for producing a plate with a first face with protrusions confined by first and second grooves includes steps of: etching recessed zones into a plate; depositing a photoresist layer on the plate; forming a passivation layer over the photoresist layer; removing the passivation layer at the bottom of the recessed zones; electroplating metal in the recessed zones; removing the passivation layer; removing the photoresist layer; and removing the semiconductor material to expose the first and second grooves.
申请公布号 US2010037461(A1) 申请公布日期 2010.02.18
申请号 US20090538797 申请日期 2009.08.10
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MICHEL BRUNO;BRUNSCHWILER THOMAS J.;ROTHUIZEN HUGO E.;KLOTER URS
分类号 B21D53/02;H01L23/10;H01L23/40;H01L23/42 主分类号 B21D53/02
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