OPTICAL INTEGRATOR, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an illumination optical system almost uniformly adjusting a pupil intensity distribution at each point on an irradiated surface.

SOLUTION: An optical integrator (9) formed in an optical path of the illumination optical system illuminating irradiated surfaces (M;W) based on light from a light source (1) has a plurality of first refractive surfaces having predetermined refracting power in a Z direction and a plurality of second refractive surfaces provided on the rear side of the first refractive surfaces and having predetermined refracting power in the Z direction. At least one second refractive surface has a linear dimming part formed in an area other than a boundary between the adjacent second refractive surfaces. The dimming part has a size along an optical axis direction and has a dimming rate characteristic that the dimming rate is increased as the position of light reaching the irradiated surface goes away from the center of the irradiated surface in a Y direction.

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