| 摘要 |
The disclosure relates to a system and device for evaluating imperfections in a lens for a display for an electronic device. The evaluation device comprises: a substrate; and a pattern imposed on the substrate. The pattern comprises a series of lines in a grid imposed on the substrate wherein when the pattern is viewed through the lens, the series of lines having thickness of between approximately 10 and approximately 150 microns, spaced in intervals between approximately 20 microns and approximately 300 microns from center to center, the pattern is distorted around an area where a defect is present in the lens. With the device, the lens is identifiable as being defective if the pattern appears as a moiré distortion in the area when viewed through the lens.
|
