发明名称 |
THIN FILM TRANSISTOR, SUBSTRATE AND MANUFACTURING METHOD THEREOF |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an oxide semiconductor thin film transistor substrate improving process efficiency and reliability, and to provide a manufacturing method thereof. <P>SOLUTION: The oxide semiconductor thin film transistor includes: a gate line formed on an insulating substrate and including a gate electrode; a data line crossing the gate line and including a drain electrode connection part; an oxide semiconductor active layer pattern formed on the periphery of the gate electrode; a passivation layer having a first opening formed on the data line and the oxide semiconductor active layer pattern to expose the drain electrode connection part and a second opening for exposing the oxide semiconductor active layer pattern; and a drain electrode for electrically connecting the oxide semiconductor active layer pattern and the drain electrode connection part by the first and the second openings. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010041058(A) |
申请公布日期 |
2010.02.18 |
申请号 |
JP20090182979 |
申请日期 |
2009.08.06 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
LEE YOUNG-WOOK;YOO HONG SUK;SONG JEAN-HO;YOUN JAE-HYOUNG;KIN SHOJIN |
分类号 |
H01L29/786;G02F1/1368;H01L21/28;H01L21/336;H01L21/768;H01L29/417;H01L29/423;H01L29/49 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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