发明名称 THIN FILM TRANSISTOR, SUBSTRATE AND MANUFACTURING METHOD THEREOF
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an oxide semiconductor thin film transistor substrate improving process efficiency and reliability, and to provide a manufacturing method thereof. <P>SOLUTION: The oxide semiconductor thin film transistor includes: a gate line formed on an insulating substrate and including a gate electrode; a data line crossing the gate line and including a drain electrode connection part; an oxide semiconductor active layer pattern formed on the periphery of the gate electrode; a passivation layer having a first opening formed on the data line and the oxide semiconductor active layer pattern to expose the drain electrode connection part and a second opening for exposing the oxide semiconductor active layer pattern; and a drain electrode for electrically connecting the oxide semiconductor active layer pattern and the drain electrode connection part by the first and the second openings. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010041058(A) 申请公布日期 2010.02.18
申请号 JP20090182979 申请日期 2009.08.06
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 LEE YOUNG-WOOK;YOO HONG SUK;SONG JEAN-HO;YOUN JAE-HYOUNG;KIN SHOJIN
分类号 H01L29/786;G02F1/1368;H01L21/28;H01L21/336;H01L21/768;H01L29/417;H01L29/423;H01L29/49 主分类号 H01L29/786
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