发明名称 PATTERN FORMING METHOD, AND PHOTOSENSITIVE COMPOSITION USED THEREFOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern forming method capable of preventing short circuiting failure or the like between patterns, and capable of forming easily a highly reliable and highly precise pattern at low cost, and a photosensitive composition suitable for the pattern forming method. <P>SOLUTION: This pattern forming method forms a coating film of the photosensitive composition on a substrate, exposes and develops the coating film, to be formed into the pattern, deposits inorganic powder on the obtained pattern, and burns it. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010039431(A) 申请公布日期 2010.02.18
申请号 JP20080205563 申请日期 2008.08.08
申请人 TAIYO INK MFG LTD 发明人 KAMAYACHI YUICHI;FUKUSHIMA KAZUNOBU
分类号 G03F7/40;G03F7/027;H01J9/02;H01J11/02;H01J11/22;H01J11/34;H01J11/36;H01L21/027;H01L21/28;H01L21/3205;H01L21/768 主分类号 G03F7/40
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