MULTI GENERATOR PLASMA SYSTEM

摘要

PURPOSE: A multi generator plasma system is provided to perform various plasma processes by selectively supplying a pulse to a chamber. CONSTITUTION: A reactive gas is inserted inside a chamber(100). The plasma is generated according to the external power. A power supply unit(120) applies at least one pulse to an electrode on the chamber, an electrode on the side of the chamber, and an electrode at lower part of the chamber. A control signal is applied according to the plasma mode of the chamber. The controller(130) control the supply of the power and supplies a pulse to one electrode. A first power source supply unit supplies the control signal to the electrode located on the chamber according to the control signal.