发明名称 |
METHOD OF PROCESSING GLASS SUBSTRATE SURFACE |
摘要 |
<p>The present invention is to provide a method for processing the whole of a glass substrate surface so as to give a surface excellent in flatness and surface roughness. The present invention provides a method of processing a glass substrate surface using a processing technique selected from the group consisting of ion-beam etching, gas cluster ion-beam etching, plasma etching, and nano-ablation, wherein a frame element satisfying the following (1) and (2) is arranged along the periphery of the glass substrate before the glass substrate surface is processed: (1) the difference between the height of the frame element and the height of the glass substrate surface is 1 mm or smaller; and (2) the frame element has a width which is not smaller than one-half the beam diameter or laser light diameter to be used in the processing technique.</p> |
申请公布号 |
EP2152638(A1) |
申请公布日期 |
2010.02.17 |
申请号 |
EP20080764774 |
申请日期 |
2008.05.21 |
申请人 |
ASAHI GLASS CO., LTD. |
发明人 |
OKAMURA, KENJI;ITO, MASABUMI |
分类号 |
C03B19/14;C03C15/00;C03C15/02;C03C19/00;C03C23/00 |
主分类号 |
C03B19/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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