发明名称 PROCESS AND APPARATUS FOR PRODUCING TRICHLOROSILANE AND PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON
摘要 <p>A method of manufacturing trichlorosilane includes a conversion reaction process (first reaction process) for producing a first reaction product gas, which contains trichlorosilane, dichlorosilylene, hydrogen chloride, and high-order silane compounds, by performing a conversion reaction of silicon tetrachloride and hydrogen, which are raw materials, in a first temperature range that is equal to or higher than 1000°C and equal to or lower than 1900°C; a first cooling process for cooling the first reaction product gas to a temperature of 950°C or lower within 1 sec (except that the first reaction product gas is cooled to a temperature lower than 600°C within 0.01 sec); a second reaction process for maintaining the temperature of the first reaction product gas in a second temperature range, which is equal to or higher than 600°C and equal to or lower than 950°C, during the time that is equal to or more than 0.01 sec and equal to or less than 5 sec; and a second cooling process for cooling a second reaction product gas, which has been subjected to the second reaction process, to a temperature lower than 600°C.</p>
申请公布号 EP2154110(A1) 申请公布日期 2010.02.17
申请号 EP20080764590 申请日期 2008.05.23
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 SAIKI, WATARU;MIZUSHIMA, KAZUKI;URUSHIHARA, MAKOTO
分类号 C01B33/107;C01B33/027 主分类号 C01B33/107
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