SUBSTRATE TREATMNET APPARATUS AND SUBSTRATE TREATMNET METHOD

摘要

PURPOSE: An apparatus and a method for processing a substrate are provided to control the energy of a neutral beam by generating a capacitively coupled plasma by forming a DLC(Diamond-like Carbon) layer containing an electrode part with a perceptible flatness. CONSTITUTION: A first power source part(112) supplies RF power. A first matching circuit part(172) is connected in series with the first power source part. A chamber part(100) forms a vacuum. An electrode part(130) is electrically connected to the first matching circuit part and is arranged in the chamber part. A DLC layer(140) is formed on the surface of the electrode part. The neutral beam extract unit(150) passes through a neutralized beam from the DLC layer.