| 摘要 |
The present invention relates to a regular lithography method in digital lithography using a spatial light modulator, wherein the regular lithography method adjusts a focus to a scan pitch and spacing between beams so that the projection structure formed on a substrate by beams projected onto the substrate can be mathematically defined on the basis of a projection configuration angle, to thereby form a regular projection structure of a regular triangle configuration and a right-angle isosceles triangle configuration of super resolution, to increase a scan ratio while maintaining the super resolution and the regular projection structure, to increase a projection length ratio while maintaining the super resolution, the regular projection structure, and the number of micro-mirrors, and to ensure, at the same time, the regularity, accuracy, economical advantages, efficiency and rapidity of the digital lithography which makes the high-speed generation and transmission of a digital mask by the structural compression based on a projection structure. |
