发明名称 |
TRANSISTOR OF IMAGE SENSOR, METHOD OF MANUFACTURING THEREOF |
摘要 |
PURPOSE: A transistor of an image sensor and a method for manufacturing the same are provided to solve an isolation problem between different conductive wells by forming a BJT(Bipolar Junction Transistor) used for a CMOS image sensor without using the wells. CONSTITUTION: A second conductive well is formed on the first conductive transistor region of a substrate and a first conductive well is formed on the second conductive transistor region of the substrate. A gate pattern(200a) of the first conductive transistor is formed on the second conductive well of the first conductive transistor region. A gate pattern(200b) of the second conductive transistor is formed on the first conductive well of the second conductive transistor region. A lamination film(200c) with an identical laminated structure to the gate pattern is formed on a trench type insulation layer of the junction transistor region. A bipolar junction(300) is formed on the lamination film. A contact(440) connected to each junction of the bipolar junction is formed.
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申请公布号 |
KR20100018264(A) |
申请公布日期 |
2010.02.17 |
申请号 |
KR20080076953 |
申请日期 |
2008.08.06 |
申请人 |
DONGBU HITEK CO., LTD. |
发明人 |
PARK, HYUNG JIN |
分类号 |
H01L27/146;H01L29/73;H04N5/335;H04N5/357;H04N5/369;H04N5/374 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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