发明名称 |
PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS |
摘要 |
<p>A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.</p> |
申请公布号 |
EP2154569(A1) |
申请公布日期 |
2010.02.17 |
申请号 |
EP20080752731 |
申请日期 |
2008.05.14 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
NEGI, TAKAYUKI;SAKAGUCHI, TAKAHIRO;KISHIOKA, TAKAHIRO |
分类号 |
G03F7/023;G02B3/00;G03F7/00;G03F7/004 |
主分类号 |
G03F7/023 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|