发明名称 VACUUM TREATMENT UNIT AND VACUUM TREATMENT PROCESS
摘要 Vacuum treatment unit and vacuum treatment process for carrying out a plasma process, wherein the treatment is carried out in a vacuum chamber (1) in which an apparatus for producing an electric low-voltage arc discharge (15) (LVAD), comprising a cathode (10) and an anode (13) which can be electrically connected to the cathode via an arc generator, and a workpiece support (7) for accommodating and moving workpieces (2) which can be electrically connected to a bias generator (16) and also at least one feed line (8) for inert and/or reactive gas are arranged. Here, at least part of the surface of the anode is made of graphite and is operated at high temperature.
申请公布号 KR20100018585(A) 申请公布日期 2010.02.17
申请号 KR20097026978 申请日期 2008.04.22
申请人 OERLIKON TRADING AG, TRUBBACH 发明人 RAMM JURGEN;WIDRIG BENO;KASEMANN STEPHAN;PIMENTA MARCELO DORNELLES;MASSLER ORLAW;HANSELMANN BARBARA
分类号 C23C14/32;C23C14/06;C23C14/22;C23C16/26 主分类号 C23C14/32
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