发明名称 |
VACUUM TREATMENT UNIT AND VACUUM TREATMENT PROCESS |
摘要 |
Vacuum treatment unit and vacuum treatment process for carrying out a plasma process, wherein the treatment is carried out in a vacuum chamber (1) in which an apparatus for producing an electric low-voltage arc discharge (15) (LVAD), comprising a cathode (10) and an anode (13) which can be electrically connected to the cathode via an arc generator, and a workpiece support (7) for accommodating and moving workpieces (2) which can be electrically connected to a bias generator (16) and also at least one feed line (8) for inert and/or reactive gas are arranged. Here, at least part of the surface of the anode is made of graphite and is operated at high temperature. |
申请公布号 |
KR20100018585(A) |
申请公布日期 |
2010.02.17 |
申请号 |
KR20097026978 |
申请日期 |
2008.04.22 |
申请人 |
OERLIKON TRADING AG, TRUBBACH |
发明人 |
RAMM JURGEN;WIDRIG BENO;KASEMANN STEPHAN;PIMENTA MARCELO DORNELLES;MASSLER ORLAW;HANSELMANN BARBARA |
分类号 |
C23C14/32;C23C14/06;C23C14/22;C23C16/26 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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