发明名称 MULTILAYER-FILM REFLECTIVE MIRROR AND EUV OPTICAL EXPOSURE APPARATUS COMPRISING SAME
摘要 An optical apparatus comprises a plurality of multilayer-film reflective mirror that are capable of reflecting an electromagnetic wave in an extreme ultraviolet region. The multilayer-film reflective mirrors are arranged along an optical axis of the electromagnetic wave, and at least two of the multilayer-film reflective mirrors have reflecting wavelength characteristics being different from each other, in a wavelength region other than the extreme ultraviolet region. Another embodiment comprises a multilayer-film reflective mirror comprising an absorbing layer that absorbs an electromagnetic wave in at least a part of a wavelength region other than the extreme ultraviolet region.
申请公布号 KR20100017245(A) 申请公布日期 2010.02.16
申请号 KR20097024318 申请日期 2008.02.22
申请人 NIKON CORPORATION 发明人 MURAKAMI KATSUHIKO;KOMIYA TAKAHARU
分类号 G02B5/08;G03F7/20 主分类号 G02B5/08
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