发明名称 Radiation Sensitive Composition for Forming an Insulating Film, Insulating Film and Display Device
摘要 There is disclosed a radiation sensitive composition containing a silane compound represented by the following formula (1): (R<1>)pSi(X)4-p wherein R<1> is an unhydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3, a hydrolyzate thereof and a condensate of the hydrolyzate; and a compound which generates an acid or base upon exposure to radiation. The composition is used to form an insulating film for an organic EL display device, and an interlayer insulating film for a liquid crystal display device.
申请公布号 KR100942124(B1) 申请公布日期 2010.02.16
申请号 KR20030004517 申请日期 2003.01.23
申请人 发明人
分类号 G03F7/075 主分类号 G03F7/075
代理机构 代理人
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